200mm silicon wafers were introduced in 1985 and are still considered the industry standard today. There are more 200mm (8″) wafers produced world wide than any other diameter. These wafers are used for a variety of applications that include testing and calibrating equipment to devices that might be used in your cellular phone or flat screen television. SVM carries a large variety of 200mm wafers in our multi-million dollar inventory. Here are examples of some of the specifications available.

SVM Sample 200mm Silicon Wafer Specifications:

200 +/- 0.2 mm
Diameter 200 +/- 0.2 mm 200 +/- 0.2 mm 200 +/- 0.2 mm 200 +/- 0.2 mm 200 +/- 0.2 mm 200 +/- 0.2 mm
Type / Dopant P/Boron P/Boron P/Boron P/Boron P/Boron P/Boron
Orientation {100} +/- 1º {100} +/- 1º {100} +/- 1º {100} +/- 1º {100} +/- 1º {100} +/- 1º
Growth Method Cz Cz Cz Cz Cz Cz
Grade Epi
Resistivity 10 – 30 Ω-cm 10 – 20 Ω-cm 1 – 100 Ω-cm 1 – 50 Ω-cm 0.005 – 0.02 Ω-cm Customer Specified
Metals < 5 x E9 < 5 x E10 < 5 x E10 < 5 x E9
Thickness 700 – 750μm 710 – 740 μm 700 – 750μm 700 – 750μm 700 – 750μm 700 – 750μm
Epi Layer Thickness Customer Specified
TTV ≤ 3μm ≤ 6μm ≤ 4μm ≤ 10μm ≤ 5μm ≤ 10μm
GTIR ≤ 5μm ≤ 5μm
Bow / Warp ≤ 40μm ≤ 40μm ≤ 40μm ≤ 50μm ≤ 40μm ≤40μm
Site Flatness (STIR) ≤ 1μm ≤ 2μm ≤ 0.2μm ≤ 1μm
Front Surface Polished Polished Polished Polished Polished Polished
Back Surface Etched Etched Etched Etched Etched Etched or oxide back seal
Particle Count ≤ 50 @ ≥ 0.12μm ≤ 50 @ ≥ 0.16μm ≤ 50 @ ≥ 0.16μm ≤ 30 @ ≥ 0.2μm ≤ 50 @ ≥ 0.16μm
Notch SEMI Standard SEMI Standard SEMI Standard SEMI Standard SEMI Standard SEMI Standard
Edges Rounded and polished per SEMI Standard Rounded and polished per SEMI Standard Rounded and polished per SEMI Standard Rounded and polished per SEMI Standard Rounded and polished per SEMI Standard Rounded and polished per SEMI Standard

 If you do not see the specification you are looking for or would like to request a quote, please CONTACT SVM to speak with a member of our experienced and knowledgeable sales staff.


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